Identificador persistente para citar o vincular este elemento:
http://hdl.handle.net/10553/114569
Título: | Gate Length-Dependent Thermal Impedance Characterization of PD-SOI MOSFETs | Autores/as: | González Pérez, Benito Cabrera Peña, José María Lazaro, Antonio |
Clasificación UNESCO: | 3307 Tecnología electrónica | Palabras clave: | Electrothermal characterization model Silicon-on-insulator (SOI) MOSFET Thermal impedance |
Fecha de publicación: | 2022 | Proyectos: | NextIOT-RTI2018-096019-B-C31 | Publicación seriada: | IEEE Transactions on Electron Devices | Resumen: | Thermal impedance is required to describe static and fast dynamic thermal behavior in silicon-oninsulator (SOI) devices. This study presents an empirical physical model, which accounts for gate length, for calculating the thermal impedance of multi-finger partially depleted (PD) SOI MOSFETs at room temperature. For the first time, the parameters of the model are obtained from measurements of ac conductance and the characteristic thermal frequency determination. The model shows decreasing thermal resistance and linearly augmented thermal capacitance with increasing gate length from 0.18 to 2.50 μm. Thus, thermal time constants of ~760 ns, extracted from a variety of gate lengths, are correctly predicted. | URI: | http://hdl.handle.net/10553/114569 | ISSN: | 0018-9383 | DOI: | 10.1109/TED.2021.3132854 | Fuente: | IEEE Transactions on Electron Devices [ISSN 0018-9383], v. 69 (2), p. 469-474, (Febrero 2022) |
Colección: | Artículos |
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