Please use this identifier to cite or link to this item: http://hdl.handle.net/10553/69276
DC FieldValueLanguage
dc.contributor.authorGonzalez, Benitoen_US
dc.contributor.authorAja, Beatrizen_US
dc.contributor.authorArtal, Eduardoen_US
dc.contributor.authorLazaro, Antonioen_US
dc.contributor.authorNúñez Ordóñez, Antonioen_US
dc.date.accessioned2020-01-23T12:41:12Z-
dc.date.available2020-01-23T12:41:12Z-
dc.date.issued2019en_US
dc.identifier.issn0018-9383en_US
dc.identifier.otherWoS-
dc.identifier.urihttp://hdl.handle.net/10553/69276-
dc.description.abstractThermal capacitances are required to describe the fast dynamic thermal behavior in the silicon-on- insulator (SOI) devices. This article presents a physical model based on the ac technique, together with the characteristic thermal frequency determination through the frequency response of the output conductance, for calculating the thermal capacitance of single-finger and multi-finger SOI-MOSFETs. The model accounts for the total gate width and substrate temperature, making evident the augmented thermal coupling when multi- fingers are used. The thermal capacitances and the corresponding time constants, extracted from a variety of gate widths and number of fingers, are correctly predicted up to a substrate temperature of 150 degrees C.en_US
dc.languageengen_US
dc.relation.ispartofIEEE Transactions on Electron Devicesen_US
dc.sourceIeee Transactions On Electron Devices[ISSN 0018-9383],v. 66 (10), p. 4120-4125en_US
dc.subject3307 Tecnología electrónicaen_US
dc.subject.otherHeat-Transporten_US
dc.subject.otherResistanceen_US
dc.subject.otherModelen_US
dc.titleTemperature-Dependent Thermal Capacitance Characterization for SOI-MOSFETsen_US
dc.typeinfo:eu-repo/semantics/Articleen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/TED.2019.2935500en_US
dc.identifier.scopus85077750556-
dc.identifier.isi000487477600001-
dc.contributor.authorscopusid56082155300-
dc.contributor.authorscopusid8695569400-
dc.contributor.authorscopusid6603673927-
dc.contributor.authorscopusid56036357200-
dc.contributor.authorscopusid7103279517-
dc.identifier.eissn1557-9646-
dc.description.lastpage4125en_US
dc.identifier.issue10-
dc.description.firstpage4120en_US
dc.relation.volume66en_US
dc.investigacionIngeniería y Arquitecturaen_US
dc.type2Artículoen_US
dc.contributor.daisngid31970355-
dc.contributor.daisngid30509911-
dc.contributor.daisngid564261-
dc.contributor.daisngid56325-
dc.contributor.daisngid33795-
dc.utils.revisionen_US
dc.contributor.wosstandardWOS:Gonzalez, B-
dc.contributor.wosstandardWOS:Aja, B-
dc.contributor.wosstandardWOS:Artal, E-
dc.contributor.wosstandardWOS:Lazaro, A-
dc.contributor.wosstandardWOS:Nunez, A-
dc.date.coverdateOctubre 2019en_US
dc.identifier.ulpgcen_US
dc.contributor.buulpgcBU-TELen_US
dc.description.sjr0,879
dc.description.jcr2,913
dc.description.sjrqQ1
dc.description.jcrqQ2
dc.description.scieSCIE
item.fulltextCon texto completo-
item.grantfulltextopen-
crisitem.author.deptGIR IUMA: Tecnología Microelectrónica-
crisitem.author.deptIU de Microelectrónica Aplicada-
crisitem.author.deptDepartamento de Ingeniería Electrónica y Automática-
crisitem.author.deptGIR IUMA: Sistemas de Información y Comunicaciones-
crisitem.author.deptIU de Microelectrónica Aplicada-
crisitem.author.deptDepartamento de Ingeniería Electrónica y Automática-
crisitem.author.orcid0000-0001-6864-9736-
crisitem.author.orcid0000-0003-1295-1594-
crisitem.author.parentorgIU de Microelectrónica Aplicada-
crisitem.author.parentorgIU de Microelectrónica Aplicada-
crisitem.author.fullNameGonzález Pérez, Benito-
crisitem.author.fullNameNúñez Ordóñez, Antonio-
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