Please use this identifier to cite or link to this item: https://accedacris.ulpgc.es/handle/10553/46912
DC FieldValueLanguage
dc.contributor.authorGonzález, B.en_US
dc.contributor.authorRoldán, J. B.en_US
dc.contributor.authorIñiguez, B.en_US
dc.contributor.authorLázaro, A.en_US
dc.contributor.authorCerdeira, A.en_US
dc.contributor.otherGonzalez, Benito-
dc.contributor.otherRoldan Aranda, Juan Bautista-
dc.date.accessioned2018-11-23T09:21:30Z-
dc.date.available2018-11-23T09:21:30Z-
dc.date.issued2015en_US
dc.identifier.issn0026-2692en_US
dc.identifier.urihttps://accedacris.ulpgc.es/handle/10553/46912-
dc.description.abstractDC thermal effects modelling for nanometric silicon-on-insulator (SOI) and bulk fin-shaped field-effect transistors (FinFETs) is presented. Among other features, the model incorporates self-heating effects (SHEs), velocity saturation and short-channel effects. SHEs are analysed in depth by means of thermal resistances, which are determined through an equivalent thermal circuit, accounting for the degraded thermal conductivity of the ultrathin films within the device. Once the thermal resistance for single-fin devices has been validated for different gate lengths and biases, comparing the modelled output characteristics and device temperatures with numerical simulations obtained using Sentaurus Device, the thermal model is extended by circuital analysis to multi-fin devices with multiple fingers.en_US
dc.languageengen_US
dc.publisher0026-2692-
dc.relation.ispartofMicroelectronicsen_US
dc.sourceMicroelectronics Journal[ISSN 0026-2692],v. 46, p. 320-326en_US
dc.subject3307 Tecnología electrónicaen_US
dc.subject.otherFin-shaped field-effect transistor (FinFET)en_US
dc.subject.otherSelf-heating effects (SSE)en_US
dc.subject.otherThermal resistanceen_US
dc.subject.otherCompact modellingen_US
dc.titleDC self-heating effects modelling in SOI and bulk FinFETsen_US
dc.typeinfo:eu-repo/semantics/Articleen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.mejo.2015.02.003en_US
dc.identifier.scopus84924153108-
dc.identifier.isi000353081200007-
dcterms.isPartOfMicroelectronics Journal-
dcterms.sourceMicroelectronics Journal[ISSN 0026-2692],v. 46 (4), p. 320-326-
dc.contributor.authorscopusid56082155300-
dc.contributor.authorscopusid7006608138-
dc.contributor.authorscopusid55148428400-
dc.contributor.authorscopusid56036357200-
dc.contributor.authorscopusid7003780995-
dc.description.lastpage326en_US
dc.description.firstpage320en_US
dc.relation.volume46en_US
dc.investigacionIngeniería y Arquitecturaen_US
dc.type2Artículoen_US
dc.identifier.wosWOS:000353081200007-
dc.contributor.daisngid1092737-
dc.contributor.daisngid294988-
dc.contributor.daisngid91160-
dc.contributor.daisngid56325-
dc.contributor.daisngid137230-
dc.identifier.investigatorRIDH-6803-2015-
dc.identifier.investigatorRIDC-6844-2012-
dc.utils.revisionen_US
dc.contributor.wosstandardWOS:Gonzalez, B-
dc.contributor.wosstandardWOS:Roldan, JB-
dc.contributor.wosstandardWOS:Iniguez, B-
dc.contributor.wosstandardWOS:Lazaro, A-
dc.contributor.wosstandardWOS:Cerdeira, A-
dc.date.coverdateEnero 2015en_US
dc.identifier.ulpgcen_US
dc.contributor.buulpgcBU-TELen_US
dc.description.jcr0,876-
dc.description.jcrqQ3-
dc.description.scieSCIE-
item.fulltextCon texto completo-
item.grantfulltextopen-
crisitem.author.deptGIR IUMA: Tecnología Microelectrónica-
crisitem.author.deptIU de Microelectrónica Aplicada-
crisitem.author.deptDepartamento de Ingeniería Electrónica y Automática-
crisitem.author.orcid0000-0001-6864-9736-
crisitem.author.parentorgIU de Microelectrónica Aplicada-
crisitem.author.fullNameGonzález Pérez, Benito-
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