Please use this identifier to cite or link to this item: http://hdl.handle.net/10553/43594
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dc.contributor.authorMarrero-Martín, M.en_US
dc.contributor.authorSzydzik, T.en_US
dc.contributor.authorGarcía, J.en_US
dc.contributor.authorGonzález, B.en_US
dc.contributor.authorHernández, A.en_US
dc.date.accessioned2018-11-21T16:23:44Z-
dc.date.available2018-11-21T16:23:44Z-
dc.date.issued2011en_US
dc.identifier.isbn9780819486561en_US
dc.identifier.issn0277-786Xen_US
dc.identifier.urihttp://hdl.handle.net/10553/43594-
dc.description.abstractVariable capacitors, the varactors, are key components in many types of radiofrequency circuits and thus high quality varactors are essential to achieve high quality factors in these devices. This work presents results of a study on the variation of tuning range and quality factor when varying the depth and separation of N+ diffusions in a PN junction varactor with fixed number of cells. For test needs four types of cells, varying the geometry of N+ and P+ diffusions were designed. The varactors were formed by horizontally and vertically overlapping cells. Based on their implementation structure, the varactors were divided into two groups, each comprising 4 varactors. The varactors belonging to the first group have all N+ diffusions connected to the buried layer. Varactors from the second group use floating N+ diffusions and a buried N+ diffusion to separate pairs formed by two adjacent cells. Post implementation measurements show that the area of varactors from in the first and second group is 1795.74 μm2(51.9 × 34.6) and 1288.92 μm2 (46.7 × 27.6), respectively. The varactors from the 1st group have a high tuning range, whereas the ones from the 2nd group high quality factors and require less area. © 2011 SPIE.
dc.languagespaen_US
dc.relation.ispartofProceedings of SPIE - The International Society for Optical Engineeringen_US
dc.sourceProceedings of SPIE - The International Society for Optical Engineering[ISSN 0277-786X],v. 8067 (80670T)en_US
dc.subject3307 Tecnología electrónicaen_US
dc.subject.otherTuning range,RFICs, Unit cells, Quality factor, PN varactoren_US
dc.titleEffect of separation and depth of N<sup>+</sup>diffusions in the quality factor and tuning range of PN varactorsen_US
dc.typeinfo:eu-repo/semantics/conferenceObjectes
dc.typeConferenceObjectes
dc.relation.conferenceVLSI Circuits and Systems V
dc.identifier.doi10.1117/12.888663
dc.identifier.scopus79958043496-
dc.contributor.authorscopusid23005327400-
dc.contributor.authorscopusid39262669300-
dc.contributor.authorscopusid8383160900-
dc.contributor.authorscopusid56082155300-
dc.contributor.authorscopusid57194681887-
dc.identifier.issue80670T-
dc.relation.volume8067-
dc.investigacionIngeniería y Arquitecturaen_US
dc.type2Actas de congresosen_US
dc.date.coverdateJunio 2011
dc.identifier.conferenceidevents121406
dc.identifier.ulpgces
item.fulltextCon texto completo-
item.grantfulltextopen-
crisitem.event.eventsstartdate18-04-2010-
crisitem.event.eventsenddate20-04-2010-
crisitem.author.deptIUMA Sistemas de Información y Comunicaciones-
crisitem.author.deptIU de Microelectrónica Aplicada-
crisitem.author.deptDepartamento de Ingeniería Electrónica y Automática-
crisitem.author.deptIUMA Sistemas de Información y Comunicaciones-
crisitem.author.deptIU de Microelectrónica Aplicada-
crisitem.author.deptDepartamento de Ingeniería Electrónica y Automática-
crisitem.author.deptIUMA Sistemas de Información y Comunicaciones-
crisitem.author.deptIU de Microelectrónica Aplicada-
crisitem.author.deptDepartamento de Ingeniería Electrónica y Automática-
crisitem.author.orcid0000-0002-0861-9954-
crisitem.author.orcid0000-0003-3561-0135-
crisitem.author.orcid0000-0001-6864-9736-
crisitem.author.parentorgIU de Microelectrónica Aplicada-
crisitem.author.parentorgIU de Microelectrónica Aplicada-
crisitem.author.parentorgIU de Microelectrónica Aplicada-
crisitem.author.fullNameMarrero Martín, Margarita Luisa-
crisitem.author.fullNameSzydzik, Tomasz-
crisitem.author.fullNameGarcía García, Javier-
crisitem.author.fullNameGonzález Pérez, Benito-
Appears in Collections:Actas de congresos
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