Identificador persistente para citar o vincular este elemento: http://hdl.handle.net/10553/41300
Título: DC characteristics with substrate temperature for GaN on Si MOS-HEMTs
Autores/as: Rodriguez, R. 
Gonzalez, B. 
Garcia, J. 
Vega Martínez, Aurelio 
Nunez, A. 
Clasificación UNESCO: 330790 Microelectrónica
Palabras clave: AlGaN/GaN
MOS-HEMT
Substrate temperature
Fecha de publicación: 2017
Publicación seriada: Spanish Conference on Electron Devices 
Conferencia: 2017 Spanish Conference on Electron Devices, CDE 2017 
Resumen: DC characteristics of AlGaN/GaN on Si MOS-HEMTs are measured and numerically simulated, with substrate temperature up to 140 degrees C, varying the gate width and gate length. Different gate recess depths are simulated in ATLAS in order to further investigate and optimize the device performance. Thermal boundary conditions and device thermal resistance are included in the structure for accurate simulation of the heating response. In addition, the relationship of the threshold voltage and saturation velocity with the substrate temperature and gate width has been studied and set in order to ease the modelling of these devices.
URI: http://hdl.handle.net/10553/41300
ISBN: 9781509050727
ISSN: 2163-4971
DOI: 10.1109/CDE.2017.7905214
Fuente: 2017 Spanish Conference on Electron Devices, CDE 2017 (7905214)
Colección:Actas de congresos
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