Identificador persistente para citar o vincular este elemento: http://hdl.handle.net/10553/121973
Título: Patterning of metal oxide thin films using a H2/He atmospheric pressure plasma jet
Autores/as: Sener, M. Emre
Sathasivam, Sanjayan
Palgrave, Robert
Quesada Cabrera, Raúl 
Caruana, Daren J.
Clasificación UNESCO: 230318 Metales
220410 Física de plasmas
Fecha de publicación: 2020
Publicación seriada: Green Chemistry 
Resumen: A hydrogen-doped helium atmospheric pressure plasma jet (APPJ) is shown to be effective for the chemical reduction of metal oxides. Copper and tin oxide films (CuO and SnO2) show rapid (<2 seconds) and complete reduction to zero valence metal after exposure to the plasma jet, as revealed by X-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy, and Raman spectroscopy. After a total residence time of the plasma jet of 100 seconds, titanium oxide (TiO2) produced a surface decorated with Ti2+, Ti3+ and Ti4+ with proportions of 16, 38 and 46 atom%, respectively, as determined by XPS peak integration. Similarly, with tungsten oxide (WO3), after exposure for a few seconds, W5+ was produced, yielding a deep blue electrically conductive coating. The treatment of these oxide films by this dielectric radio frequency (RF) barrier discharge plasma jet provides a level of redox conversion not seen in any other technique, particularly for TiO2, especially with a comparable power input. The precise nature of the reduction is unclear; however, the involvement of free electrons may have an important role in the reduction process.
URI: http://hdl.handle.net/10553/121973
ISSN: 1463-9262
DOI: 10.1039/D0GC00080A
Fuente: Green Chemistry [ISSN 1463-9262], v. 22(4), p. 1406-1413
Colección:Artículos
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