Identificador persistente para citar o vincular este elemento:
http://hdl.handle.net/10553/121973
Campo DC | Valor | idioma |
---|---|---|
dc.contributor.author | Sener, M. Emre | en_US |
dc.contributor.author | Sathasivam, Sanjayan | en_US |
dc.contributor.author | Palgrave, Robert | en_US |
dc.contributor.author | Quesada Cabrera, Raúl | en_US |
dc.contributor.author | Caruana, Daren J. | en_US |
dc.date.accessioned | 2023-04-21T11:43:23Z | - |
dc.date.available | 2023-04-21T11:43:23Z | - |
dc.date.issued | 2020 | en_US |
dc.identifier.issn | 1463-9262 | en_US |
dc.identifier.uri | http://hdl.handle.net/10553/121973 | - |
dc.description.abstract | A hydrogen-doped helium atmospheric pressure plasma jet (APPJ) is shown to be effective for the chemical reduction of metal oxides. Copper and tin oxide films (CuO and SnO2) show rapid (<2 seconds) and complete reduction to zero valence metal after exposure to the plasma jet, as revealed by X-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy, and Raman spectroscopy. After a total residence time of the plasma jet of 100 seconds, titanium oxide (TiO2) produced a surface decorated with Ti2+, Ti3+ and Ti4+ with proportions of 16, 38 and 46 atom%, respectively, as determined by XPS peak integration. Similarly, with tungsten oxide (WO3), after exposure for a few seconds, W5+ was produced, yielding a deep blue electrically conductive coating. The treatment of these oxide films by this dielectric radio frequency (RF) barrier discharge plasma jet provides a level of redox conversion not seen in any other technique, particularly for TiO2, especially with a comparable power input. The precise nature of the reduction is unclear; however, the involvement of free electrons may have an important role in the reduction process. | en_US |
dc.language | eng | en_US |
dc.relation.ispartof | Green Chemistry | en_US |
dc.source | Green Chemistry [ISSN 1463-9262], v. 22(4), p. 1406-1413 | en_US |
dc.subject | 230318 Metales | en_US |
dc.subject | 220410 Física de plasmas | en_US |
dc.title | Patterning of metal oxide thin films using a H2/He atmospheric pressure plasma jet | en_US |
dc.type | info:eu-repo/semantics/article | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1039/D0GC00080A | en_US |
dc.identifier.issue | 4 | - |
dc.relation.volume | 22 | en_US |
dc.investigacion | Ciencias | en_US |
dc.type2 | Artículo | en_US |
dc.utils.revision | Sí | en_US |
dc.identifier.ulpgc | Sí | en_US |
dc.contributor.buulpgc | BU-BAS | en_US |
dc.description.sjr | 2,221 | |
dc.description.jcr | 10,182 | |
dc.description.sjrq | Q1 | |
dc.description.jcrq | Q1 | |
dc.description.scie | SCIE | |
item.grantfulltext | open | - |
item.fulltext | Con texto completo | - |
crisitem.author.dept | GIR IUNAT: Fotocatálisis y espectroscopía para aplicaciones medioambientales. | - |
crisitem.author.dept | IU de Estudios Ambientales y Recursos Naturales | - |
crisitem.author.orcid | 0000-0002-6288-9250 | - |
crisitem.author.parentorg | IU de Estudios Ambientales y Recursos Naturales | - |
crisitem.author.fullName | Quesada Cabrera, Raúl | - |
Colección: | Artículos |
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