Identificador persistente para citar o vincular este elemento: http://hdl.handle.net/10553/52229
Campo DC Valoridioma
dc.contributor.authorCelinski, P.en_US
dc.contributor.authorAbbott, D.en_US
dc.contributor.authorAl-Sarawi, S. F.en_US
dc.contributor.authorLópez Feliciano, José Franciscoen_US
dc.date.accessioned2018-11-25T18:31:37Z-
dc.date.available2018-11-25T18:31:37Z-
dc.date.issued2000en_US
dc.identifier.issn0026-2692en_US
dc.identifier.urihttp://hdl.handle.net/10553/52229-
dc.description.abstractThe neuron-MOS (neu-MOS) transistor, recently discovered by Shibata and Ohmi in 1991 [T. Shibata, T. Ohmi, International Electron Devices Meeting, Technical Digest, 1991] uses capacitively coupled inputs onto a floating gate. Neu-MOS enables the design of conventional analog and digital integrated circuits with a significant reduction in transistor count [L.S.Y. Wong, C.Y. Kwok, G.A. Rigby, in: Proceedings of the 1997 IEEE Custom Integrated Circuits Conference, 1997; B. Gonzales, D. Abbott, S.F. Al-Sarawi, A. Hernandez, J. Garcia, J. Lopez, in: Proceedings of the XIII Design of Circuits and Integrated Systems Conference (DCIS'98), 1998, pp. 62-66]. Furthermore, neu-MOS circuit characteristics are relatively insensitive to transistor parameter variations inherent in all MOS fabrication processes. Neu-MOS circuit characteristics depend primarily on the floating gate coupling capacitor ratios. It is also thought that this enhancement in the functionality of the transistor, i.e. at the most elemental level in circuits, introduces a degree of flexibility that may lead to the realisation of intelligent functions at a system level [T. Ohmi, T. Shibata, in: Proceedings of the 20th International Conference on Microelectronics, vol. 1, 1995, pp. 11-18]. This paper extends the neu-MOS paradigm to complementary gallium arsenide based on HIGFET transistors. The design and HSPICE simulation results of a neu-GaAs ripple carry adder are presented, demonstrating the potential for very significant transistor count and area reduction through the use of neu-GaAs in VLSI design. Preliminary simulations indicate a reduction of a factor of four in transistor count for the same power dissipation as conventional complementary GaAs. The small gate leakage is shown to be useful in eliminating unwanted charge build-up on the floating gate. (C) 2000 Elsevier Science Ltd. All rights reserved.en_US
dc.languagespaen_US
dc.publisher0026-2692
dc.relation.ispartofMicroelectronicsen_US
dc.sourceMicroelectronics Journal[ISSN 0026-2692],v. 31, p. 577-582en_US
dc.subject.otherComplementaryen_US
dc.titleNovel extension of neu-MOS techniques to neu-GaAsen_US
dc.typeinfo:eu-repo/semantics/Articleen_US
dc.typeArticleen_US
dc.relation.conferenceMICRO/MEMS 99 Symposium
dc.identifier.scopus0347109737-
dc.identifier.isi000088565200013-
dc.contributor.authorscopusid6701421283-
dc.contributor.authorscopusid56053895400-
dc.contributor.authorscopusid7004170747-
dc.contributor.authorscopusid7404444793-
dc.description.lastpage582en_US
dc.description.firstpage577en_US
dc.relation.volume31en_US
dc.investigacionIngeniería y Arquitecturaen_US
dc.type2Artículoen_US
dc.contributor.daisngid2345841-
dc.contributor.daisngid681194-
dc.contributor.daisngid256376-
dc.contributor.daisngid846472-
dc.utils.revisionen_US
dc.contributor.wosstandardWOS:Celinski, P-
dc.contributor.wosstandardWOS:Abbott, D-
dc.contributor.wosstandardWOS:Al-Sarawi, SF-
dc.contributor.wosstandardWOS:Lopez, JF-
dc.date.coverdateJulio 2000en_US
dc.identifier.ulpgcen_US
dc.contributor.buulpgcBU-TELen_US
dc.description.jcr0,608
dc.description.jcrqQ2
dc.description.scieSCIE
item.fulltextSin texto completo-
item.grantfulltextnone-
crisitem.author.deptGIR IUMA: Diseño de Sistemas Electrónicos Integrados para el procesamiento de datos-
crisitem.author.deptIU de Microelectrónica Aplicada-
crisitem.author.deptDepartamento de Ingeniería Electrónica y Automática-
crisitem.author.orcid0000-0002-6304-2801-
crisitem.author.parentorgIU de Microelectrónica Aplicada-
crisitem.author.fullNameLópez Feliciano, José Francisco-
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