Please use this identifier to cite or link to this item: http://hdl.handle.net/10553/49935
Title: Highly photoactive anatase nanoparticles obtained using trifluoroacetic acid as an electron scavenger and morphological control agent
Authors: Calatayud, David G.
Jardiel, Teresa
Peiteado, Marco
Fernández Rodríguez, Cristina 
Espino Estévez, M. Rocio
Doña Rodríguez, Jose M. 
Palomares, Francisco J.
Rubio, Fausto
Fernández-Hevia, Daniel
Caballero, Amador C.
UNESCO Clasification: 2307 Química física
Keywords: Heterogeneous Photocatalytic Oxidation
Tio2 Single-Crystals
Exposed 001 Facets
Conversion Efficiency
Titanium(Iv) Oxide, et al
Issue Date: 2013
Publisher: 2050-7488
Project: Generación Solar de Hidrógeno Por Vía Fotocatalítica Sobre Semiconductores (Geshtos) 
"Producción de Fotocatalizadores Nanoestructurados Por Procesos de Bajo Coste y Alta Productividad Para Descontaminación de Aguas Residuales: Nanobac 
Journal: Journal of Materials Chemistry A 
Abstract: Fluorine species adsorbed on the surface of TiO2 anatase nanoparticles improve their photocatalytic performance by reducing the recombination rate of photogenerated electrons and holes. Trifluoroacetic acid (TFAA) has been recently proposed as a promising harmless substitute for hydrofluoric acid (HF) in preparing fluorine-modified anatase with good scavenger properties. However the photocatalytic performance of the TiO2 nanoparticles also depends on their specific morphology, by which the number and type of crystal facets, which remain exposed, are determined. A comprehensive study is presented in this contribution which for the first time describes the role of TFAA in stabilizing the highly photoactive {001} TiO2 facets. Furthermore, by reducing the amount of water incorporated into the reaction medium, a simple one-step synthesis method is also proposed that allows the preparation of TFAA-modified anatase nanoparticles with specific morphology and selected stabilized facets, eventually yielding a semiconductor material with excellent photocatalytic properties.
URI: http://hdl.handle.net/10553/49935
ISSN: 2050-7488
DOI: 10.1039/c3ta12970e
Source: Journal of Materials Chemistry A [ISSN 2050-7488], v. 1, p. 14358-14367
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