Please use this identifier to cite or link to this item: http://hdl.handle.net/10553/53009
DC FieldValueLanguage
dc.contributor.authorIzquierdo, Javieren_US
dc.contributor.authorSouto, Ricardo M.en_US
dc.contributor.authorSantana, Juan Joséen_US
dc.contributor.authorGonzález, Sergioen_US
dc.contributor.otherSouto, Ricardo M.-
dc.contributor.otherSantana Rodriguez, Juan Jose-
dc.contributor.otherIzquierdo Perez, Javier-
dc.date.accessioned2019-02-04T14:43:19Z-
dc.date.available2019-02-04T14:43:19Z-
dc.date.issued2010en_US
dc.identifier.issn0013-4686en_US
dc.identifier.urihttp://hdl.handle.net/10553/53009-
dc.description.abstractScanning electrochemical microscopy (SECM) was used to study the film formation of benzotriazole towards corrosion of copper. SECM was operated in the feedback mode by using ferrocene–methanol as redox mediator, and the sample was left unbiased at all times to freely attain its open circuit potential in the test environment. Following exposure to aggressive electrolytes the anticorrosion abilities of the layers were characterized by image analysis and by an electrochemical method derived from the experimental approach curves. Changes in the shape of the approach curves were clearly observed during the inhibitor film formation process. They showed the transition from an active conducting behaviour towards ferrocinium reoxidation typical of unprotected copper, to a surface exhibiting insulating characteristics when the metal was covered by a surface film containing the inhibitor. This supports that SECM is a practical technique in the investigation of corrosion inhibitor performance. However, a consistent tendency for the characterization of inhibitor film formation using SECM measurements in the positive feedback mode for the copper-benzotriazole system was only found if the experiments were conducted when the inhibitor molecule was not present in the test solution. That is, inhibitor molecules were found to interact not only with the copper surface during the monitoring process, but with the SECM tip as well, this effect being significantly enhanced when chloride ions were present in the electrolyte. Finally, a procedure to image the chemical activity of copper surfaces partially covered with the inhibitor film with SECM is proposed.en_US
dc.languageengen_US
dc.publisher0013-4686-
dc.relation.ispartofElectrochimica actaen_US
dc.sourceElectrochimica Acta[ISSN 0013-4686],v. 55 (28), p. 8791-8800en_US
dc.subject3303 ingeniería y tecnología químicasen_US
dc.subject3306 Ingeniería y tecnología eléctricasen_US
dc.subject.otherCorrosion inhibitionen_US
dc.subject.otherCopperen_US
dc.subject.otherBenzotriazoleen_US
dc.subject.otherScanning electrochemical microscopyen_US
dc.titleUses of scanning electrochemical microscopy for the characterization of thin inhibitor films on reactive metals: The protection of copper surfaces by benzotriazoleen_US
dc.typeinfo:eu-repo/semantics/articleen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.electacta.2010.08.020en_US
dc.identifier.scopus78049286780-
dc.identifier.isi000284443400061-
dcterms.isPartOfElectrochimica Acta-
dcterms.sourceElectrochimica Acta[ISSN 0013-4686],v. 55 (28), p. 8791-8800-
dc.contributor.authorscopusid35388543300-
dc.contributor.authorscopusid35436067200-
dc.contributor.authorscopusid7202200085-
dc.contributor.authorscopusid7005304036-
dc.description.lastpage8800-
dc.identifier.issue28-
dc.description.firstpage8791-
dc.relation.volume55-
dc.investigacionIngeniería y Arquitecturaen_US
dc.type2Artículoen_US
dc.identifier.wosWOS:000284443400061-
dc.contributor.daisngid716020-
dc.contributor.daisngid839683-
dc.contributor.daisngid4781958-
dc.contributor.daisngid181058-
dc.identifier.investigatorRIDG-4004-2014-
dc.identifier.investigatorRIDC-4040-2008-
dc.identifier.investigatorRIDNo ID-
dc.utils.revisionen_US
dc.identifier.ulpgces
dc.description.jcr3,65
dc.description.jcrqQ1
dc.description.scieSCIE
item.fulltextSin texto completo-
item.grantfulltextnone-
crisitem.author.deptGIR Sistemas industriales de eficiciencia, instrumentación y protección-
crisitem.author.deptDepartamento de Ingeniería de Procesos-
crisitem.author.deptGIR Sistemas industriales de eficiciencia, instrumentación y protección-
crisitem.author.deptDepartamento de Ingeniería de Procesos-
crisitem.author.orcid0000-0002-3030-2195-
crisitem.author.orcid0000-0002-3030-2195-
crisitem.author.parentorgDepartamento de Ingeniería Electrónica y Automática-
crisitem.author.parentorgDepartamento de Ingeniería Electrónica y Automática-
crisitem.author.fullNameSantana Rodríguez, Juan José-
crisitem.author.fullNameSantana Rodríguez, Juan José-
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