Please use this identifier to cite or link to this item: http://hdl.handle.net/10553/43244
Title: Photocatalytic degradation of phenol and phenolic compounds: Part I. Adsorption and FTIR study
Authors: Araña Mesa, Francisco Javier 
Pulido Melián, Elisenda 
Rodríguez López, V. M.
Peña Alonso, A.
Doña Rodríguez, José Miguel 
González Díaz, Oscar Manuel 
Pérez Peña, Jesús 
UNESCO Clasification: 221001 Catálisis
Keywords: Photocatalysis
Phenolic compounds
Isotherms
FTIR
TiO2
Issue Date: 2007
Publisher: 0304-3894
Project: Preparacion, Caracterizacion y Propiedades de Sistemas Fotocataliticos Altamente Reactivos Basados en Aplica<Ciones Medioambientales 
Tratamiento de Aguas Residuales Urbanas E Industriales Mediante Sistemas Naturales de Depuración, Sistemas Fotocatalíticos y Su Combinación. 
Journal: Journal of Hazardous Materials 
Conference: 1st European Conference on Environmental Applications of Advanced Oxidation Processes 
Abstract: With the goal of predicting the photocatalytic behaviour of different phenolic compounds (catechol, resorcinol, phenol, m-cresol and o-cresol), their adsorption and interaction types with the TiO2 Degussa P-25 surface were studied. Langmuir and Freundlich isotherms were applied in the adsorption studies. The obtained results indicated that catechol adsorption is much higher than those of the other phenolics and its interaction occurs preferentially through the formation of a catecholate monodentate. Resorcinol and the cresols interact by means of hydrogen bonds through the hydroxyl group, and their adsorption is much lower than that of catechol. Finally, phenol showed an intermediate behaviour, with a Langmuir adsorption constant, KL, much lower than that of catechol, but a similar interaction. The interaction of the selected molecules with the catalyst surface was evaluated by means of FTIR experiments, which allowed us to determine the probability of OH radical attack to the aromatic ring.
URI: http://hdl.handle.net/10553/43244
ISSN: 0304-3894
DOI: 10.1016/j.jhazmat.2007.04.066
Source: Journal of Hazardous Materials [ISSN 0304-3894], v. 146 (3), p. 520-528
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