Name Japanese Journal of Applied Physics, Part 2: Letters

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Title Issue Date
Reactive ion beam etching of indium phosphide in electron cyclotron resonance plasma using methane/hydrogen/nitrogen mixtures Sendra, José Ramón ; Anguita, José Issued date: 1994 DOI: 10.1143/JJAP.33.L390 Source: Japanese Journal of Applied Physics[ISSN 0021-4922],v. 33, p. L390-L393 SCIE Artículo