Please use this identifier to cite or link to this item: http://hdl.handle.net/10553/44566
DC FieldValueLanguage
dc.contributor.authorJose Santana, Juanen_US
dc.contributor.authorPähler, Maikeen_US
dc.contributor.authorSchuhmann, Wolfgangen_US
dc.contributor.authorSouto, Ricardo M.en_US
dc.contributor.otherSchuhmann, Wolfgang-
dc.contributor.otherSouto, Ricardo M.-
dc.contributor.otherSantana Rodriguez, Juan Jose-
dc.date.accessioned2018-11-22T00:39:39Z-
dc.date.available2018-11-22T00:39:39Z-
dc.date.issued2012en_US
dc.identifier.issn2192-6506en_US
dc.identifier.urihttp://hdl.handle.net/10553/44566-
dc.description.abstractAlternating current scanning electrochemical microscopy (AC-SECM) is used to investigate the inhibition of copper corrosion by four potential inhibitors, namely benzotriazole (BTAH), 5-methyl-benzotriazole (MBTAH), 2-mercaptobenzimidazole (MBI), and ethyl xanthate (EX). It is shown that the formation of inhibitor films on the metal can be followed from the decrease of the substrate's local electrochemical activity associated with the formation of inhibitor-containing surface layers. Sensitive imaging can be performed that accounts for changes in electrochemical activity of the modified surfaces, as well as for their corrosive attack from the environment. AC-SECM is shown to be a powerful technique for the investigation of corrosion processes.en_US
dc.languageengen_US
dc.relation.ispartofChemPlusChemen_US
dc.sourceChempluschem[ISSN 2192-6506],v. 77 (8), p. 707-712en_US
dc.subject3303 ingeniería y tecnología químicasen_US
dc.subject3306 Ingeniería y tecnología eléctricasen_US
dc.subject.otherBenzotriazolesen_US
dc.subject.otherCopperen_US
dc.subject.otherCorrosion inhibitionen_US
dc.subject.otherScanning probe microscopyen_US
dc.subject.othersurface chemistryen_US
dc.titleInvestigation of copper corrosion inhibition with frequency-dependent alternating-current scanning electrochemical microscopyen_US
dc.typeinfo:eu-repo/semantics/Articlees
dc.typeArticlees
dc.identifier.doi10.1002/cplu.201200091
dc.identifier.scopus84866122047-
dc.identifier.isi000307401800013-
dcterms.isPartOfChempluschem-
dcterms.sourceChempluschem[ISSN 2192-6506],v. 77 (8), p. 707-712-
dc.contributor.authorscopusid35436067200-
dc.contributor.authorscopusid57084101600-
dc.contributor.authorscopusid7005188945-
dc.contributor.authorscopusid7005304036-
dc.description.lastpage712-
dc.description.firstpage707-
dc.relation.volume77-
dc.investigacionIngeniería y Arquitecturaen_US
dc.type2Artículoen_US
dc.identifier.wosWOS:000307401800013-
dc.contributor.daisngid839683-
dc.contributor.daisngid28226859-
dc.contributor.daisngid12801-
dc.contributor.daisngid181058-
dc.identifier.investigatorRIDS-2626-2016-
dc.identifier.investigatorRIDG-4004-2014-
dc.identifier.investigatorRIDC-4040-2008-
dc.utils.revisionen_US
dc.date.coverdateAgosto 2012
dc.identifier.ulpgces
dc.description.scieSCIE
item.fulltextSin texto completo-
item.grantfulltextnone-
crisitem.author.deptGIR Energía, Corrosión, Residuos y Agua-
crisitem.author.deptDepartamento de Ingeniería de Procesos-
crisitem.author.orcid0000-0002-3030-2195-
crisitem.author.parentorgDepartamento de Ingeniería Electrónica y Automática-
crisitem.author.fullNameSantana Rodríguez, Juan José-
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