Influence of Growth Geometry on the electrochemical behavior fo TI thin films for medical applications

Abstract

The response of titanium (Ti) thin films is strongly influenced by their microstructure, which depends on deposition parameters and geometrical configuration, particularly in biomedical applications. This study evaluates the effect of growth geometry on the microstructure, morphology, and corrosion resistance of Ti thin films. Three coatings were fabricated by Glancing Angle Deposition (GLAD) using a custom DC reactive magnetron sputtering system [2]. In the first configuration, the target was perpendicular to the substrate (α = 0°). In the second and third, the substrate was tilted at 85° (α = 85°), with the last including a 180° azimuthal rotation to obtain a zigzag morphology. Film thickness and morphology were analyzed by SEM, surface roughness by AFM, and crystallinity by XRD. Corrosion behavior in simulated body fluid was assessed using direct and alternating current electrochemical techniques. Results show improved anticorrosion performance with increasing structural complexity: the inclined film exhibited slightly enhanced corrosion resistance, while the zigzag architecture provided the highest resistance, consistent with previous findings on GLAD-engineered Ti nanostructures.